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Physics, 28.11.2019 23:31 justinxvengance7249

3. consider an mos capacitor with n+ polysilicon gate and n-type silicon substrate. assume nd=1016cm-3 and let ef-ec=0.2 ev in the n+ polysilicon. assume the oxide has a thickness of tox= 300å. also assume that (polysilicon)=(crystal silicon). (a) calculate the metal-semiconductor work function difference. (b) calculate the threshold voltage for the ideal case of zero fixed oxide charge and zero interface states

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3. consider an mos capacitor with n+ polysilicon gate and n-type silicon substrate. assume nd=1016cm...

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