The number of contaminating particles on a silicon wafer prior to a certain rinsing process was determined for each wafer in a sample of size 100, resulting in the following frequencies: Number of particles 0 1 2 3 4 5 6 7 8 9 10 11 12 13 14 Frequency 1 2 3 12 11 15 19 10 10 4 5 3 2 2 1 A button hyperlink to the SALT program that reads: Use SALT. (a) What proportion of the sampled wafers had at least one particle