Mathematics, 03.06.2020 00:58 DarcieMATHlin2589
An article in the Journal of the Electrochemical Society describes an experiment to investigate the low-pressure vapor deposition of polysilicon. The experiment was carried out in a large-capacity reactor at Sematech in Austin, Texas. The reactor has several wafer positions, and four of these positions are selected at random. The response variable is film thickness uniformity. Three replicates of the experiment were run, and the data are as follows:
Water Position
Uniformity
1
2.76
5.67
4.49
2
1.43
1.70
2.19
3
2.34
1.97
1.47
4
0.94
1.36
1.65
(a) Estimate the total variability in the uniformity response.
(b) How much of the total variability in the uniformity response is due to the difference between positions in the reactor?
(c) To what level could the variability in the uniformity response be reduced, if the position-to-position variability in the reactor could be eliminated? Do you believe this is a significant reduction?
Answers: 2
Mathematics, 21.06.2019 21:50, gamergladiator43
Tamar is measuring the sides and angles of tuv to determine whether it is congruent to the triangle below. which pair of measurements would eliminate the possibility that the triangles are congruent
Answers: 1
Mathematics, 22.06.2019 00:20, sheena33
Aline is perpendicular to another line m2= (-1/m1), where m1 is the slope of the original line and m2 is the slope of the perpendicular line. which of the following equations represents the line that passes through the point (-2,1) and is perpendicular to the line below?
Answers: 2
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