Purity of copper films by evaporation and sputtering.

(a) Discuss three factors that affect the purity of copper films when deposited by evaporation from a tungsten filament.

(b) Discuss three factors that affect the purity of copper films when deposited by argon sputtering of a copper target.

Determine whether or not it is possible to compress air adiabatically from k to 140 kpa and 400 k. what is the entropy change during this process?

The filament of an incandescent lamp has a temperature of 2000k. calculate the fraction of radiation emitted in the visible light band if the filament is approximated as blackbody

Atank with constant volume contains 2.27 kg of a mixture of water phases (liquid-vapor). in the initial state the temperature and the quality are 127 °c and 0.6, respectively. the mixture is heated until the temperature of 160 oc is reached. illustrate the process in a t-v diagram. then, determine (1) the mass of the vapor in kg at the initial state, (2) the final pressure in kpa.