Engineering, 14.11.2019 02:31 jbrown76241
Consider a hypothetical element whose structure can be based on either of the following: a)cell a – a base-centered tetragonal containing two atoms per cell, at 0 0 0 and ½ ½ 0, for which a = 2å and c = 3å b)cell b – simple tetragonal with one atom per cell at 0 0 0 (hint: are "a" and "c" the same for a and b? ) this is shown in c& s, fig. 2-11. determine simplified structure factor equations for each cell and the position (2 values) of the first four lines that would be observed (|f2| 0)on a powder pattern made with cu k radiation. plot the 2 values of these lines in the manner of fig 10-2 (c& s) and label each line with its indices relative to cell a and cell b. draw the two cells in the proper relation to one another, and show that the indices of any one observed line (other than the obvious 0 0 l) refer to the same plane of atoms. this problem illustrates several points: (1) we can choose any cell we wish (even a cell that is not one of the recognized bravais lattices); (2) the miller indices of any given plan depend on the choice of the cell; (3) the diffraction pattern of a material is independent of the choice of cell
Answers: 3
Engineering, 03.07.2019 14:10, volleyballfun24
If the thermal strain developed in polyimide film during deposition is given as 0.0044. assume room temperature is kept at 17.3 c, and thermal coefficient of expansion for the film and the substrate are 54 x 10^-6c^-1 and 3.3 x 10^-6c^-1respectively. calculate the deposition temperature.
Answers: 3
Engineering, 04.07.2019 18:20, maciemarklin79981
A3-mm-thick panel of aluminum alloy (k 177 w/m-k, c 875 j/kg-k and ? = 2770 kg/m) is finished on both sides with an epoxy coating that must be cured at or above t,-150°c for at least 5 min. the production line for the curing operation involves two steps: (1) heating in a large oven with air at ts,0-175°c and a convection coefficient of h, 40 w/m2. k, and (2) cooling in a large chamber with air at 25°c and a con- vection coefficient of he 10 w/m2.k. the heating portion of the process is conducted over a time interval te which exceeds the ime required to reach 150°c by 5 min (h = r + 300 s). the coating has an emissivity of ? = 0.8, and the temperatures of the oven and chamber walls are 175 and 25°c, respectively. if the panel is placed in the oven at an initial temperature of 25°c and removed from the chamber at a safe-to-touch tempera ture of 37°c, what is the total elapsed time for the two-step curing operation?
Answers: 3
Engineering, 04.07.2019 18:20, annette211pdd8v9
For a gate width of 2 m into the paper, determine the force required to hold the gate abc at its location.
Answers: 1
Consider a hypothetical element whose structure can be based on either of the following: a)cell a –...
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