How many moles are in 453 g Caso4?

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

How many mmols of tris-hcl are there in 100 ml of a 100 mm tris-hcl buffer solution at ph 8.1? note that the 100 mm refers to the sum of tris and tris-hcl concentrations?

Gwhich r group would most likely be found in a hydrophobic area of the tertiary structure of a globular protein? which r group would most likely be found in a hydrophobic area of the tertiary structure of a globular protein? −ch2−oh −ch2−o||c−nh2 −ch2−coo− −ch2−ch2−ch2−ch2−n+h3