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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 21.06.2019 22:30, shantrice1831
Using the periodic table, complete the table to describe each atom. type in your answers. a ? b? c? d? e? f?
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magnesium chloride crystallizes as a hydrate, MgCl2. xH20. When 2...
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