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Chemistry, 19.02.2021 22:30 callieaustin4809
does someone have the answer for this problem? it’s for stem chemistry. It would help me a lot. Thank you!
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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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does someone have the answer for this problem? it’s for stem chemistry. It would help me a lot. Than...
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