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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 03:50, AysiaRamosLee
What is the temperature of one mole of helium gas at stp?
Answers: 3
The cation Pb4+ with each of the following anions: CO32− and HPO42−
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