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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 21.06.2019 20:00, Britny2386
2h2s + 3o2 2so2 + 2h2o which option gives the correct mole ratios? h2s: so2 = 2: 2 and o2: h2o = 3: 2 h2s: so2 = 2: 3 and o2: h2o = 3: 2 h2s: so2 = 4: 4 and o2: h2o = 5: 4 h2s: so2 = 4: 6 and o2: h2o = 4: 4
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