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Chemistry, 21.06.2019 16:00, saby30
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 21.06.2019 20:30, lemonsalt9378
14. complete and balance the equations for the single displacement reactions. a. zn + pb(no3)2 -> b. al + niso4 -> 15. complete and balance the equations for the double displacement reactions. a. agno3(aq) + nacl(aq) -> b. mg(no3)2(aq) + koh(aq) -> 16. complete and balance the equations for the combustion reactions. a. __ ch4 + o2 -> b. __ c3h6 + o2 -> c. + o2 ->
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Chemistry, 21.06.2019 23:00, jasmineharris121
The drawing represents the movement of particles in a substance. what changes of state can this substance undergo
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K forms the compound K2O , which is an ionic compound that is brittle. Identify another element, M ,...
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