Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Answer asap need by wednesday morning explain how a buffer works, using an ethanoic acid/sodium ethanoate system including how the system resists changes in ph upon addition of a small amount of base and upon addition of a small amount of acid respectively. include the following calculations in your i. calculate the ph of a solution made by mixing 25cm3 0.1m ch3cooh and 40cm3 0.1m ch3coo-na+. [ka = 1.74 x 10-5 m] ii. calculate the ph following the addition of a 10cm3 portion of 0.08 m naoh to 500cm3 of this buffer solution. iii. calculate the ph following the addition of a 10cm3 portion of 0.08 m hcl to 200cm3 of the original buffer solution.